Raman and photoreflectance study of InAs quantum dots on GaAs(100) substrates subjected to an in-situ

H. Morales-Cortés, C. Mejía-García, J. S. Rojas-Ramírez, I. Martínez-Velis, R. Contreras-Guerrero, M. Ramírez-López, A. M. Paniagua-Mercado, M. López-López

Research output: Contribution to journalArticlepeer-review

Abstract

An analysis of the growth by molecular beam epitaxy technique of InAs self-assembling quantum dots (SAQDs) on GaAs (100) substrates subjected to an in situ annealing treatment was carried out. In the annealing process the GaAs buffer layer surface was exposed to high temperatures for a few seconds with the shutter of an arsenic Knudsen cell closed. In order to obtain InAs/GaAs (100) quantum dot samples with different annealing times and temperatures the Stranski-Krastanov growth method was applied. A Raman study in the range of 240 and 340 cm -1 at 18K and at room temperature (300K) with He-Ne laser was performed. The TO and LO-GaAs modes were identified. A blue shift of these modes indicates strain effects or structural disorder. The Photoreflectance (PR) spectra in the range of 0.9 and 1.35 eV presented transitions associated with SAQDs.

Original languageEnglish
Pages (from-to)44-49
Number of pages6
JournalJournal of the Australian Ceramic Society
Volume48
Issue number1
StatePublished - 2012

Keywords

  • AFM
  • InAs/GaAs quantum dots
  • Photoreflectance spectroscopy
  • Raman scattering

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