Plasma-induced size reduction in gold nanoclusters embedded in a dielectric matrix

J. Fandiño; A. Crespo; G. Santana; L. Rodríguez-Fernández; J. C. Alonso; M. F. García-Sánchez; A. Ortiz; O. Vigil; A. Lopez-Suarez; A. Oliver

doi:10.1166/sam.2009.1051

Plasma-induced size reduction in gold nanoclusters embedded in a dielectric matrix

J. Fandiño, A. Crespo, G. Santana, L. Rodríguez-Fernández, J. C. Alonso, M. F. García-Sánchez, A. Ortiz, O. Vigil, A. Lopez-Suarez, A. Oliver

Research output: Contribution to journal › Article › peer-review

1 Scopus citations

Abstract

Sandwich structures of silicon-nitride/gold/silicon-nitride with approximate thickness of 40 nm were fabricated by means of inductively-coupled remote plasma enhanced chemical vapor deposition and sputtering. In an intermediate step, nanostructure gold was subject to different surface plasma treatments, varying the plasma treatment time as well as the plasma atmosphere. The resulting structures were studied by high resolution transmission electron microscopy and Rutherford backscattering. As a consequence of plasma treatments, the gold nanoparticles mean size decreases, the particle areal distributions become narrower and the particle shapes evolve from island-like to near spherical symmetry. Oxygen plasma-etch of gold nanoparticles was observed.

Original language	English
Pages (from-to)	249-253
Number of pages	5
Journal	Science of Advanced Materials
Volume	1
Issue number	3
DOIs	https://doi.org/10.1166/sam.2009.1051
State	Published - 1 Dec 2009
Externally published	Yes

Keywords

Nanoclusters
PECVD
z-Contrast images

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10.1166/sam.2009.1051

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title = "Plasma-induced size reduction in gold nanoclusters embedded in a dielectric matrix",

abstract = "Sandwich structures of silicon-nitride/gold/silicon-nitride with approximate thickness of 40 nm were fabricated by means of inductively-coupled remote plasma enhanced chemical vapor deposition and sputtering. In an intermediate step, nanostructure gold was subject to different surface plasma treatments, varying the plasma treatment time as well as the plasma atmosphere. The resulting structures were studied by high resolution transmission electron microscopy and Rutherford backscattering. As a consequence of plasma treatments, the gold nanoparticles mean size decreases, the particle areal distributions become narrower and the particle shapes evolve from island-like to near spherical symmetry. Oxygen plasma-etch of gold nanoparticles was observed.",

keywords = "Nanoclusters, PECVD, z-Contrast images",

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doi = "10.1166/sam.2009.1051",

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T1 - Plasma-induced size reduction in gold nanoclusters embedded in a dielectric matrix

AU - Fandiño, J.

AU - Crespo, A.

AU - Santana, G.

AU - Rodríguez-Fernández, L.

AU - Alonso, J. C.

AU - García-Sánchez, M. F.

AU - Ortiz, A.

AU - Vigil, O.

AU - Lopez-Suarez, A.

AU - Oliver, A.

PY - 2009/12/1

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N2 - Sandwich structures of silicon-nitride/gold/silicon-nitride with approximate thickness of 40 nm were fabricated by means of inductively-coupled remote plasma enhanced chemical vapor deposition and sputtering. In an intermediate step, nanostructure gold was subject to different surface plasma treatments, varying the plasma treatment time as well as the plasma atmosphere. The resulting structures were studied by high resolution transmission electron microscopy and Rutherford backscattering. As a consequence of plasma treatments, the gold nanoparticles mean size decreases, the particle areal distributions become narrower and the particle shapes evolve from island-like to near spherical symmetry. Oxygen plasma-etch of gold nanoparticles was observed.

AB - Sandwich structures of silicon-nitride/gold/silicon-nitride with approximate thickness of 40 nm were fabricated by means of inductively-coupled remote plasma enhanced chemical vapor deposition and sputtering. In an intermediate step, nanostructure gold was subject to different surface plasma treatments, varying the plasma treatment time as well as the plasma atmosphere. The resulting structures were studied by high resolution transmission electron microscopy and Rutherford backscattering. As a consequence of plasma treatments, the gold nanoparticles mean size decreases, the particle areal distributions become narrower and the particle shapes evolve from island-like to near spherical symmetry. Oxygen plasma-etch of gold nanoparticles was observed.

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KW - z-Contrast images

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DO - 10.1166/sam.2009.1051

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JO - Science of Advanced Materials

JF - Science of Advanced Materials

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ER -

Plasma-induced size reduction in gold nanoclusters embedded in a dielectric matrix

Abstract

Keywords

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