Photoresponse analysis of sensors fabricated with standard 2.0 μm CMOS technology

S. N.M. Mestanza, E. Rodriguez, I. Doi, J. A. Diniz, J. W. Swart, N. C. Frateschi

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

This paper reports the fabrication and optical characterizations of CMOS sensors type junction, for two different geometries L and square, with areas 112×100 μm2 and 120×120 μm2, respectively. The sensor element is a photodiode implemented with n-well, using a CMOS process based on 2μm technology. An increase in the device photocurrent is observed when the reverse bias is increased. A wavelength shift for the maximum photocurrent peak was observed in the CMOS sensors after applying a bias voltage. Preliminary results indicate that sensors with more vertices exhibit a higher wavelength shift. This behavior could arise from both the changes in the depletion width and the effective device area. The output of the reverse-biased sensors is extremely linear with respect to the applied light intensity. Both responsivity and quantum efficiency exhibit a maximum peak at = 500 nm with values of 38 mA/W and 10.2 %, respectively.

Original languageEnglish
Title of host publicationECS Transactions - 22nd Symposium on Microelectronics Technology and Devices, SBMicro2007
Pages553-560
Number of pages8
Edition1
DOIs
StatePublished - 2007
Externally publishedYes
Event22nd Symposium on Microelectronics Technology and Devices, SBMicro2007 - Rio de Janeiro, Brazil
Duration: 3 Sep 20076 Sep 2007

Publication series

NameECS Transactions
Number1
Volume9
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Conference

Conference22nd Symposium on Microelectronics Technology and Devices, SBMicro2007
Country/TerritoryBrazil
CityRio de Janeiro
Period3/09/076/09/07

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