TY - GEN
T1 - Optimization of Corona Radio Interference Levels in HVDC Transmission Lines
AU - Tejada-Martinez, Carlos
AU - Espino-Cortes, Fermin P.
AU - Ilhan, Suat
AU - Ozdemir, Aydogan
N1 - Publisher Copyright:
© 2018 IEEE.
PY - 2019/2/13
Y1 - 2019/2/13
N2 - This article presents the computation of radio interference (RI) lateral profiles produced by corona discharge in a bipolar HVDC transmission line of ±500 kV. The method used to compute the RI levels considers a transmission line model that takes into consideration the skin effect by using the concept of complex penetration depth in the pole conductors and in the ground plane. Also, the attenuation constants are calculated from the line parameters and the bipolar system is decoupled by using modal decomposition theory. Furthermore, the influence of four variables in both RI levels and the maximum bundle electric field is analyzed: sub-conductors radius, bundle spacing, the number of sub-conductors in the bundle and the soil resistivity. Afterwards, vector optimization is applied in order to minimize the RI levels produced by the bipolar line. Finally, RI lateral profiles with both nominal and optimal values are compared.
AB - This article presents the computation of radio interference (RI) lateral profiles produced by corona discharge in a bipolar HVDC transmission line of ±500 kV. The method used to compute the RI levels considers a transmission line model that takes into consideration the skin effect by using the concept of complex penetration depth in the pole conductors and in the ground plane. Also, the attenuation constants are calculated from the line parameters and the bipolar system is decoupled by using modal decomposition theory. Furthermore, the influence of four variables in both RI levels and the maximum bundle electric field is analyzed: sub-conductors radius, bundle spacing, the number of sub-conductors in the bundle and the soil resistivity. Afterwards, vector optimization is applied in order to minimize the RI levels produced by the bipolar line. Finally, RI lateral profiles with both nominal and optimal values are compared.
UR - http://www.scopus.com/inward/record.url?scp=85063088638&partnerID=8YFLogxK
U2 - 10.1109/ICHVE.2018.8641971
DO - 10.1109/ICHVE.2018.8641971
M3 - Contribución a la conferencia
AN - SCOPUS:85063088638
T3 - ICHVE 2018 - 2018 IEEE International Conference on High Voltage Engineering and Application
BT - ICHVE 2018 - 2018 IEEE International Conference on High Voltage Engineering and Application
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 2018 IEEE International Conference on High Voltage Engineering and Application, ICHVE 2018
Y2 - 10 September 2018 through 13 September 2018
ER -