TY - JOUR
T1 - Optical properties of amorphous carbon thin films prepared by plasma deposition in a graphite hollow cathode
AU - Mendez, Juan Manuel
AU - Muhl, Stephen
AU - Contreras-Puente, G.
AU - Aguilar-Hernandez, J.
N1 - Funding Information:
This work was supported by DGAPA-UNAM Project IN-104191. We would like to thank L. Gasque for her help with the obtention of the IR spectra and L. Bafios for unpublished X-ray results.
PY - 1992/11/20
Y1 - 1992/11/20
N2 - Carbon films have been produced using a graphite hollow cathode and an r.f. plasma of hydrogen or hydrogen and argon. No hydrocarbon gas was used. The films were subjected to heat treatments up to 700 °C in air. The optical properties of the films were studied using Fourier transform IR, UV-visible, Raman, ellipsometry and photoluminescence techniques before and after the annealing. Films prepared without argon have a narrower band gap and a different photoluminescence response from films prepared with argon. The index of refraction was seen to have values between 1.7 and 2.2 depending on the preparation conditions. The optical band gap of the films was generally greater than 2 eV and the annealing process both increased the gap and reduced the density of states responsible for the large photoluminescence signal.
AB - Carbon films have been produced using a graphite hollow cathode and an r.f. plasma of hydrogen or hydrogen and argon. No hydrocarbon gas was used. The films were subjected to heat treatments up to 700 °C in air. The optical properties of the films were studied using Fourier transform IR, UV-visible, Raman, ellipsometry and photoluminescence techniques before and after the annealing. Films prepared without argon have a narrower band gap and a different photoluminescence response from films prepared with argon. The index of refraction was seen to have values between 1.7 and 2.2 depending on the preparation conditions. The optical band gap of the films was generally greater than 2 eV and the annealing process both increased the gap and reduced the density of states responsible for the large photoluminescence signal.
UR - http://www.scopus.com/inward/record.url?scp=0026944498&partnerID=8YFLogxK
U2 - 10.1016/0040-6090(92)90560-X
DO - 10.1016/0040-6090(92)90560-X
M3 - Artículo
SN - 0040-6090
VL - 220
SP - 125
EP - 131
JO - Thin Solid Films
JF - Thin Solid Films
IS - 1-2
ER -