Abstract
This paper presents the results of PL and X-ray diffraction investigations for amorphous hydrogenated silicon films with and without Si nanocrystals. Hydrogenated amorphous Si layers were prepared by the hot-wire CVD method on glass substrates at the permanent mixture flow of silane /hydrogen [SiH4]/[H2] gas sources with the 7/15 flow ratio and with different oxygen flows. The joint analysis of PL and X-ray diffraction results in dependence on technological conditions and on different sizes of Si nanocrystals has been done. The correlation of optical parameters with the amorphous Si:H and crystal Si phase volumes in the films has been discussed.
Original language | English |
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Pages (from-to) | S204-S207 |
Journal | Thin Solid Films |
Volume | 518 |
Issue number | 6 SUPPL. 1 |
DOIs | |
State | Published - 1 Jan 2010 |
Keywords
- Amorphous silicon nanoclusters
- HW-CVD
- Photoluminescence
- Silicon nanocrystals
- XRD