TY - JOUR
T1 - Optical and structural characterization of nickel oxide-based thin films obtained by chemical bath deposition
AU - Vidales-Hurtado, M. A.
AU - Mendoza-Galván, A.
N1 - Funding Information:
The authors acknowledge the technical assistance of E. Urbina-Sánchez, R. Flores-Farías and M.A. Hernández-Landaverde. This work was partially supported by CONACYT.
PY - 2008/1/15
Y1 - 2008/1/15
N2 - Nickel oxide-based thin films were obtained using the chemical bath deposition method on glass and silicon substrates. The precursor solution used was a mixture of nickel nitrate, urea, and deionized water. Molar concentration of nickel (0.3-1.0 M), deposition time, and immersing cycles were considered as deposition variables. Infrared spectroscopy and X-ray diffraction data reveal that all as-deposited films correspond to the transparent turbostratic phase α(II)-Ni(OH)2. However, the rate of deposition depends on nickel content in the solution. After annealing in air at temperatures above of 300 °C, the films are transformed to the NiO phase and show a grey/black color. In these films, scanning electron microscopy images show aggregates of thin stacked sheets on their surface, such aggregates can be easily removed leaving only a thin NiO layer of about 30 nm adhered firmly to the substrate, regardless of nickel concentration in the solution and deposition time. In order to obtain thicker NiO films with good optical properties a procedure is developed performing several immersing-annealing cycles.
AB - Nickel oxide-based thin films were obtained using the chemical bath deposition method on glass and silicon substrates. The precursor solution used was a mixture of nickel nitrate, urea, and deionized water. Molar concentration of nickel (0.3-1.0 M), deposition time, and immersing cycles were considered as deposition variables. Infrared spectroscopy and X-ray diffraction data reveal that all as-deposited films correspond to the transparent turbostratic phase α(II)-Ni(OH)2. However, the rate of deposition depends on nickel content in the solution. After annealing in air at temperatures above of 300 °C, the films are transformed to the NiO phase and show a grey/black color. In these films, scanning electron microscopy images show aggregates of thin stacked sheets on their surface, such aggregates can be easily removed leaving only a thin NiO layer of about 30 nm adhered firmly to the substrate, regardless of nickel concentration in the solution and deposition time. In order to obtain thicker NiO films with good optical properties a procedure is developed performing several immersing-annealing cycles.
KW - Chemical bath deposition
KW - Nickel oxide
KW - Optical properties
UR - http://www.scopus.com/inward/record.url?scp=36448964890&partnerID=8YFLogxK
U2 - 10.1016/j.matchemphys.2007.06.036
DO - 10.1016/j.matchemphys.2007.06.036
M3 - Artículo
SN - 0254-0584
VL - 107
SP - 33
EP - 38
JO - Materials Chemistry and Physics
JF - Materials Chemistry and Physics
IS - 1
ER -