Nonlinearity analysis of FinFETs

A. Cerdeira, M. Alemán, V. Kilchitska, N. Collaert, K. De Meyer, D. Flandre

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

7 Scopus citations

Abstract

Double-gate MOS transistors and their vertical version, FinFETs, are very promising for integrated circuit low signal analog applications. In this paper we present, for the first time, the nonlinearity analysis of this type of devices which complements the already done studies about the advantages and possibilities of FinFET for analog application. The analysis was done using the transfer DC characteristics in saturation, calculating THD and HD3 by the Integral Function Method. Complementary figures-of-merit THD/Avo and HD3/Avo were also calculated. FinFETs of different channel lengths and different Fin widths were studied. Results are compared with those obtained for single-gate fully-depleted (FD) SOI MOSFETs with HALO. From the present study we can conclude that analyzed FinFETs can have better or worse nonlinearity behavior than FD SOI MOSFETs with HALO depending on the operating conditions.

Original languageEnglish
Title of host publicationProceedings of the Sixth International Caribbean Conference on Devices, Circuits and Systems, ICCDCS 2006 - Final Program and Technical Digest
Pages9-12
Number of pages4
DOIs
StatePublished - 2006
Externally publishedYes
Event6th International Caribbean Conference on Devices, Circuits and Systems, ICCDCS 2006 - Playa del Carmen, Mexico
Duration: 26 Apr 200628 Apr 2006

Publication series

NameProceedings of the Sixth International Caribbean Conference on Devices, Circuits and Systems, ICCDCS 2006 - Final Program and Technical Digest

Conference

Conference6th International Caribbean Conference on Devices, Circuits and Systems, ICCDCS 2006
Country/TerritoryMexico
CityPlaya del Carmen
Period26/04/0628/04/06

Keywords

  • Double-gate MOSFET
  • FinFET
  • Harmonic distortion
  • Nonlinearity analysis

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