Low-Threshold GaInAsSb/GaAlAsSb Double-Heterostructure Lasers Grown by LPE

M. B.Z. Morosini, J. L. Herrera-Pérez, M. S.S. Loural, A. A.G. Von Zuben, A. C.F. da Silveira, N. B. Patel

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20 Scopus citations

Abstract

We report the lowest threshold current density Ga0.86In0.14As0.19Sb0.87/Ga0.79Al0.27As0.02Sb0.98 2.2 µm lasers grown by LPE. Using transverse far-field patterns and theoretical calculations for the fundamental mode, we estimated the value of the active layer refractive index as 3.78. We also show that the development of low-threshold current stripe lasers is limited by an excessive current spread in the low-resistivity p-type active layer. This is partly solved by making the active region n-type. The minimum Ith obtained for n-type active layers was 290 mA compared to 800 mA for p-type active layers, the broad-area threshold current being the same (3 kA/cm2) in both cases.

Original languageEnglish
Pages (from-to)2103-2108
Number of pages6
JournalIEEE Journal of Quantum Electronics
Volume29
Issue number6
DOIs
StatePublished - Jun 1993
Externally publishedYes

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