Large grain size CdTe films grown on glass substrates at low temperature

M. Zapata-Torres; R. Castro-Rodriquez; A. Zapata-Navarro; John L. Wallace; Ramon Pomes; J. L. Pena

doi:10.1116/1.579627

Large grain size CdTe films grown on glass substrates at low temperature

M. Zapata-Torres, R. Castro-Rodriquez, A. Zapata-Navarro, John L. Wallace, Ramon Pomes, J. L. Pena

Research output: Contribution to journal › Comment/debate

1 Scopus citations

Abstract

Polycrystalline films of CdTe were prepared by the hot wall-close-spaced vapor transport technique on Corning glass substrates at substrate temperatures below 450 °C. The thickness of the films was constant at 25 μm for all samples grown at different substrate temperatures and different gas pressures. The film thickness was found to be a function of deposition time only (5μm per min), and virtually independent of substrate temperature and control gas pressure. The grain size was a monotonic function of film thickness, reaching 40 μm for a film thickness of 50 μm.

Original language	English
Pages (from-to)	2994-2996
Number of pages	3
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	13
Issue number	6
DOIs	https://doi.org/10.1116/1.579627
State	Published - Nov 1995
Externally published	Yes

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title = "Large grain size CdTe films grown on glass substrates at low temperature",

abstract = "Polycrystalline films of CdTe were prepared by the hot wall-close-spaced vapor transport technique on Corning glass substrates at substrate temperatures below 450 °C. The thickness of the films was constant at 25 μm for all samples grown at different substrate temperatures and different gas pressures. The film thickness was found to be a function of deposition time only (5μm per min), and virtually independent of substrate temperature and control gas pressure. The grain size was a monotonic function of film thickness, reaching 40 μm for a film thickness of 50 μm.",

author = "M. Zapata-Torres and R. Castro-Rodriquez and A. Zapata-Navarro and Wallace, {John L.} and Ramon Pomes and Pena, {J. L.}",

year = "1995",

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T1 - Large grain size CdTe films grown on glass substrates at low temperature

AU - Zapata-Torres, M.

AU - Castro-Rodriquez, R.

AU - Zapata-Navarro, A.

AU - Wallace, John L.

AU - Pomes, Ramon

AU - Pena, J. L.

PY - 1995/11

Y1 - 1995/11

N2 - Polycrystalline films of CdTe were prepared by the hot wall-close-spaced vapor transport technique on Corning glass substrates at substrate temperatures below 450 °C. The thickness of the films was constant at 25 μm for all samples grown at different substrate temperatures and different gas pressures. The film thickness was found to be a function of deposition time only (5μm per min), and virtually independent of substrate temperature and control gas pressure. The grain size was a monotonic function of film thickness, reaching 40 μm for a film thickness of 50 μm.

AB - Polycrystalline films of CdTe were prepared by the hot wall-close-spaced vapor transport technique on Corning glass substrates at substrate temperatures below 450 °C. The thickness of the films was constant at 25 μm for all samples grown at different substrate temperatures and different gas pressures. The film thickness was found to be a function of deposition time only (5μm per min), and virtually independent of substrate temperature and control gas pressure. The grain size was a monotonic function of film thickness, reaching 40 μm for a film thickness of 50 μm.

UR - http://www.scopus.com/inward/record.url?scp=0009862706&partnerID=8YFLogxK

U2 - 10.1116/1.579627

DO - 10.1116/1.579627

M3 - Comentario/Debate

SN - 0734-2101

VL - 13

SP - 2994

EP - 2996

JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

IS - 6

ER -

Large grain size CdTe films grown on glass substrates at low temperature

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