TY - JOUR
T1 - Kinetics of the drying process of an anti-adherent coating using Photothermal Radiometry and Micro-Raman
AU - Hurtado-Castañeda, D. M.
AU - Fernández, J.
AU - Velázquez, R.
AU - Estévez, M.
AU - Vargas, S.
AU - Rodríguez, R.
AU - Rodriguez, M. E.
PY - 2005
Y1 - 2005
N2 - The kinetics of the drying process of a new anti-adherent (anti-graffiti) polymeric coating containing organic solvent was determined using Photothermal Radiometry (PTR) and Micro-Raman (μ-R) Spectroscopy. PTR Spectroscopy was used to study, in real time, the kinetics of the drying process in samples protected with coatings with and without anti-adherent molecules. These were applied on a metal and silicon substrates. The PTR spectrum for coating without anti-adherent, shows a single relaxation time, while for coating containing anti-adherent shows two relaxation times corresponding to two different mechanisms: the solvent evaporation and the molecular re-arrangements of the two different molecular species present in the coating; the kinetic of the solvent evaporation is strongly dependent, as expected, on the solvent concentration.
AB - The kinetics of the drying process of a new anti-adherent (anti-graffiti) polymeric coating containing organic solvent was determined using Photothermal Radiometry (PTR) and Micro-Raman (μ-R) Spectroscopy. PTR Spectroscopy was used to study, in real time, the kinetics of the drying process in samples protected with coatings with and without anti-adherent molecules. These were applied on a metal and silicon substrates. The PTR spectrum for coating without anti-adherent, shows a single relaxation time, while for coating containing anti-adherent shows two relaxation times corresponding to two different mechanisms: the solvent evaporation and the molecular re-arrangements of the two different molecular species present in the coating; the kinetic of the solvent evaporation is strongly dependent, as expected, on the solvent concentration.
UR - http://www.scopus.com/inward/record.url?scp=33645060233&partnerID=8YFLogxK
U2 - 10.1051/jp4:2005125136
DO - 10.1051/jp4:2005125136
M3 - Artículo de la conferencia
AN - SCOPUS:33645060233
SN - 1155-4339
VL - 125
SP - 593
EP - 596
JO - Journal De Physique. IV : JP
JF - Journal De Physique. IV : JP
T2 - 13th ICPPP International Conference on Photoacoustic and PhotothermalPhenomena
Y2 - 5 July 2004 through 8 July 2004
ER -