In situ growth of ZnO inside a porous silicon matrix obtained by electrochemical etching with a hydrofluoric acid-formaldehyde solution

Engineering & Materials Science

• Electrochemical etching 100%
• Hydrofluoric acid 93%
• Porous silicon 91%
• Zinc oxide 81%
• Formaldehyde 76%
• Photoluminescence 22%
• Photocatalysis 10%
• Diffraction patterns 9%
• Isotherms 8%
• Silicon wafers 8%
• Desorption 7%
• Chemical sensors 7%
• Sulfates 7%
• Zinc 7%
• X ray diffraction 6%
• Adsorption 6%
• Nitrogen 6%
• Infrared radiation 5%
• Defects 4%

Chemistry

• Zinc Oxide 59%
• Etching 55%
• Porosity 35%
• Zinc Sulfate 9%
• Adsorption and Desorption Isotherm 7%
• Gas Sensor 6%
• Photoluminescence Spectrum 6%
• Photocatalysis 6%
• Formaldehyde 5%
• Photoluminescence 5%
• Blue 4%
• Red 4%
• Additive 4%
• Pore 4%
• Surface Area 4%
• Nitrogen 4%
• X-Ray Diffraction 3%
• Acid 2%