HFCVD and CSVT techniques working together to produce nanostructured tungsten oxide

F. Chávez, C. Felipe, E. Lima, E. Haro-Poniatowski, C. Ángeles-Chávez, O. Goiz, R. Peña-Sierra, M. A. Camacho-López

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

Hot Filament Chemical Vapour Deposition (HFCVD) was used to deposit tungsten oxide clusters on a graphite surface using a tungsten filament as source. These clusters were subsequently transported onto quartz and Si substrates where they transformed into WO3 - X nanowires. The transport of tungsten species from source to substrate was made through the Close Spaced Vapour Transport (CSVT) technique. The synthesized nanostructures were characterized by means of SEM, EDS, XRD techniques as well as by Raman spectroscopy. The results show that the nanowires have a monoclinic structure, a diameter about 100 nm and they were extended many tenths of micrometers. © 2008 Elsevier B.V. All rights reserved.
Original languageAmerican English
Pages (from-to)4191-4194
Number of pages3771
JournalMaterials Letters
DOIs
StatePublished - 15 Oct 2008
Externally publishedYes

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Tungsten
tungsten oxides
tungsten
Nanowires
Chemical vapor deposition
Tungsten deposits
filaments
nanowires
Vapors
oxide
vapor deposition
vapors
Quartz
Oxides
Graphite
Substrates
Raman spectroscopy
micrometers
Energy dispersive spectroscopy
substrate

Cite this

Chávez, F., Felipe, C., Lima, E., Haro-Poniatowski, E., Ángeles-Chávez, C., Goiz, O., ... Camacho-López, M. A. (2008). HFCVD and CSVT techniques working together to produce nanostructured tungsten oxide. Materials Letters, 4191-4194. https://doi.org/10.1016/j.matlet.2008.06.038
Chávez, F. ; Felipe, C. ; Lima, E. ; Haro-Poniatowski, E. ; Ángeles-Chávez, C. ; Goiz, O. ; Peña-Sierra, R. ; Camacho-López, M. A. / HFCVD and CSVT techniques working together to produce nanostructured tungsten oxide. In: Materials Letters. 2008 ; pp. 4191-4194.
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Chávez, F, Felipe, C, Lima, E, Haro-Poniatowski, E, Ángeles-Chávez, C, Goiz, O, Peña-Sierra, R & Camacho-López, MA 2008, 'HFCVD and CSVT techniques working together to produce nanostructured tungsten oxide', Materials Letters, pp. 4191-4194. https://doi.org/10.1016/j.matlet.2008.06.038

HFCVD and CSVT techniques working together to produce nanostructured tungsten oxide. / Chávez, F.; Felipe, C.; Lima, E.; Haro-Poniatowski, E.; Ángeles-Chávez, C.; Goiz, O.; Peña-Sierra, R.; Camacho-López, M. A.

In: Materials Letters, 15.10.2008, p. 4191-4194.

Research output: Contribution to journalArticle

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AU - Chávez, F.

AU - Felipe, C.

AU - Lima, E.

AU - Haro-Poniatowski, E.

AU - Ángeles-Chávez, C.

AU - Goiz, O.

AU - Peña-Sierra, R.

AU - Camacho-López, M. A.

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AB - Hot Filament Chemical Vapour Deposition (HFCVD) was used to deposit tungsten oxide clusters on a graphite surface using a tungsten filament as source. These clusters were subsequently transported onto quartz and Si substrates where they transformed into WO3 - X nanowires. The transport of tungsten species from source to substrate was made through the Close Spaced Vapour Transport (CSVT) technique. The synthesized nanostructures were characterized by means of SEM, EDS, XRD techniques as well as by Raman spectroscopy. The results show that the nanowires have a monoclinic structure, a diameter about 100 nm and they were extended many tenths of micrometers. © 2008 Elsevier B.V. All rights reserved.

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