Fully patterned and low temperature transparent ZnO-based inverters

G. Gutierrez-Heredia, I. Mejia, M. E. Rivas-Aguilar, N. Hernandez-Como, V. H. Martinez-Landeros, F. S. Aguirre-Tostado, M. A. Quevedo-Lopez

Research output: Contribution to journalArticlepeer-review

19 Scopus citations

Abstract

The fabrication and characterization of transparent logic inverters based on zinc oxide (ZnO) thin film transistors (TFTs) is reported.The inverters are fabricated using standard photolithographic techniques on glass substrates, and the entire fabrication process temperature is maintained < 100 C, which render the devices suitable for flexible and transparent electronics applications.Pulsed laser deposition is used to deposit aluminum-doped zinc oxide and ZnO as electrode and active semiconductor materials, respectively.Electrical characterization for individual TFTs demonstrate mobilities of ∼ 10 cm2/V-s, threshold voltages of 6 V, sub-threshold slopes of 630 mV/decade and ION/IOFF ratios of 5 × 106.Films characterized by UV-Vis showed optical transmission > 80% in the visible spectrum.The inverters are analyzed with AC input signals at frequencies of 100 and 500 Hz.The AC response shows an average rise and fall time transitions of 0.65 and 0.44 ms, respectively.Measured inverters delay is in the order of 0.21 ms.

Original languageEnglish
Pages (from-to)458-461
Number of pages4
JournalThin Solid Films
Volume545
DOIs
StatePublished - 31 Oct 2013
Externally publishedYes

Keywords

  • Aluminum-doped zinc oxide
  • Pulsed laser deposition
  • Thin film transistors
  • Transparent electronics
  • Zinc oxide

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