Formation of Si/SiOx interface and its influence on photoluminescence of Si nano-crystallites

F. G. Becerril-Espinoza, T. V. Torchynska, M. Morales Rodríguez, L. Khomenkova, L. V. Scherbina

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

Photoluminescence (PL), PL excitation and atomic force microscopy investigations of porous silicon (PSi) have been done in as-prepared state and after 1.0 year storage in ambient air. In as-prepared state, PSi layers are characterised by two PL bands peaked at 1.70 and 2.00 eV. The complex analysing of the changes of PL parameters during the formation of the Si/SiOx interface give possibility to make conclusion concerning the PL and PL excitation mechanisms for both PL bands in Si-nano-crystallites.

Original languageEnglish
Pages (from-to)759-761
Number of pages3
JournalMicroelectronics Journal
Volume34
Issue number5-8
DOIs
StatePublished - May 2003

Keywords

  • Nano-structures
  • Photoluminescence
  • Porous silicon

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