Engineering & Materials Science
Extreme ultraviolet lithography
69%
Mirrors
47%
Ions
34%
Fluxes
30%
Charged particles
26%
Hot Temperature
22%
Temperature
18%
Plasmas
17%
Thermal evaporation
15%
Ion bombardment
15%
X ray photoelectron spectroscopy
11%
Surface structure
11%
Photons
11%
Surface morphology
10%
Spectroscopy
10%
Light sources
10%
Structural properties
10%
Atoms
9%
Testing
9%
Surface properties
9%
Scattering
8%
Wavelength
8%
Experiments
3%
Mathematics
Extreme Ultraviolet Lithography
100%
Mirror
52%
Lifetime
47%
Interaction
33%
Reflectivity
31%
EUV Lithography
11%
Plasma
11%
X-ray Spectroscopy
10%
Surface Morphology
10%
Reflectometry
9%
Irradiation
7%
Evaporation
7%
Testing
7%
Spectroscopy
6%
Photon
6%
Performance
6%
Wavelength
5%
Structural Properties
5%
Incidence
5%
Scattering
4%
Angle
4%
Experiment
3%
Spectrality
3%
Energy
3%
Range of data
3%
Demonstrate
3%
EUV Source
0%
Physics & Astronomy
accumulators
46%
mirrors
33%
life (durability)
31%
interactions
18%
reflectance
14%
charged particles
8%
ions
7%
plasma pinch
7%
ion scattering
6%
energetic particles
5%
ion irradiation
5%
surface properties
5%
performance
4%
lithography
4%
fluence
4%
photoelectron spectroscopy
4%
light sources
4%
incidence
4%
evaporation
3%
temperature
3%
photons
2%
spectroscopy
2%
atoms
2%
wavelengths
2%
x rays
2%
energy
1%
Chemistry
Reflectivity
36%
Pinch Plasma
18%
Surface
14%
Ion
12%
Ion Scattering Spectroscopy
11%
Surface Structure
7%
Photon
7%
X-Ray Photoelectron Spectroscopy
5%
Time
2%