Abstract
This paper presents the results of PL spectrum studies for Si nano-clusters in an amorphous silicon matrix. The four amorphous Si layers were prepared by the hot-wire CVD method on glass substrates at a temperature of 250 {ring operator}C and different filament temperatures in the range of 1650-1950 {ring operator}C. The joint analysis of PL and X ray diffraction results dependant on technological conditions has been done. PL bands deal with Si nanocrystals and amorphous Si nanoclusters are discussed as well.
Original language | English |
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Pages (from-to) | 267-270 |
Number of pages | 4 |
Journal | Superlattices and Microstructures |
Volume | 45 |
Issue number | 4-5 |
DOIs | |
State | Published - Apr 2009 |
Keywords
- Amorphous silicon nanoclusters
- HW-CVD
- Photoluminescence
- Silicon nanocrystals
- XRD