Elemental depth profiles of MgB2/Si precursor and superconducting films

E. Andrade, Š Chromik, Mi Jergel, Ma Jergel, C. Falcony, V. Štrbík, M. F. Rocha

Research output: Contribution to journalConference articlepeer-review

2 Scopus citations

Abstract

The elemental composition and depth profiles of MgB2/Si(100) and MbB2/Si(111) films were studied by IBA methods. Films were prepared by sequential e-beam evaporation of B and Mg components onto silicon substrates kept at room temperature. One half of the Mg-B precursors were then annealed in situ at 630 °C to obtain superconducting MgB2 films. Both types of films, i.e. not-annealed as well as those annealed, were then bombarded with 2400 keV 3He+. Nuclear reaction particle peaks with positive Q values are induced by 3He+ bombardment on 10B, 11B, 16O and 12C nuclei. The IBA method applied is actually a combination of Rutherford backscattering/ nuclear reaction (RBS/NRA) for analyzing MgB2/Si films. The best zero resistance Tco value of the MgB2/Si superconducting films was 29.3 K. The IBA of the MgB2/Si superconducting films shows that Mg and B diffuse into the silicon substrate and that the Mg concentration on the film surface is almost zero. X-ray diffraction indicates that Mg2Si grains were formed at the film/substrate interface. Low concentrations of oxygen were also found in the films either in the form of MgO or B2O 3.

Original languageEnglish
Pages (from-to)768-772
Number of pages5
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume219-220
Issue number1-4
DOIs
StatePublished - Jun 2004
EventProceedings of the Sixteenth International Conference on Ion - Albuquerque, NM., United States
Duration: 29 Jun 20034 Jul 2003

Keywords

  • Depth profiles
  • E-beam deposition
  • IBA methods
  • MgB thin films

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