TY - JOUR
T1 - Effects of saccharin and anions (SO4 2−, Cl−) on the electrodeposition of Co–Ni alloys
AU - Altamirano-Garcia, Liliana
AU - Vazquez-Arenas, Jorge
AU - Pritzker, Mark
AU - Luna-Sánchez, Rosa
AU - Cabrera-Sierra, Román
N1 - Publisher Copyright:
© 2014, Springer-Verlag Berlin Heidelberg.
PY - 2014/2
Y1 - 2014/2
N2 - The electrodeposition of Co–Ni alloys is investigated to examine the mechanistic effects of chloride, sulfate and saccharin on the resulting alloy composition, deposition current efficiency and partial current densities of the cathodic reactions. When deposition is carried out in chloride, sulfate or mixed sulfate-chloride solutions without saccharin, the influence of hydrogen evolution (HER) becomes dominant and deleterious at higher overpotentials, leading to very low metal deposition current efficiency and the formation of a hydroxide/oxide film on the substrate. This problem is significantly reduced when saccharin is added to the mixed sulfate-chloride plating bath and to a lesser extent the sulfate-only solution. Although saccharin is ineffective in suppressing H+ reduction at low overpotentials, it is very effective at inhibiting H2O reduction at high overpotentials and enabling metal deposition to more easily occur. The system follows anomalous behavior at all current densities both in the absence and presence of saccharin, although it approaches normal behavior as the current density increases toward −1,000 A m−2 due to Co(II) reduction being mass transfer-controlled.
AB - The electrodeposition of Co–Ni alloys is investigated to examine the mechanistic effects of chloride, sulfate and saccharin on the resulting alloy composition, deposition current efficiency and partial current densities of the cathodic reactions. When deposition is carried out in chloride, sulfate or mixed sulfate-chloride solutions without saccharin, the influence of hydrogen evolution (HER) becomes dominant and deleterious at higher overpotentials, leading to very low metal deposition current efficiency and the formation of a hydroxide/oxide film on the substrate. This problem is significantly reduced when saccharin is added to the mixed sulfate-chloride plating bath and to a lesser extent the sulfate-only solution. Although saccharin is ineffective in suppressing H+ reduction at low overpotentials, it is very effective at inhibiting H2O reduction at high overpotentials and enabling metal deposition to more easily occur. The system follows anomalous behavior at all current densities both in the absence and presence of saccharin, although it approaches normal behavior as the current density increases toward −1,000 A m−2 due to Co(II) reduction being mass transfer-controlled.
KW - Co–Ni alloys
KW - Electrodeposition
KW - Electrolyte
KW - Reaction mechanism
KW - Saccharin
UR - http://www.scopus.com/inward/record.url?scp=85027929359&partnerID=8YFLogxK
U2 - 10.1007/s10008-014-2616-7
DO - 10.1007/s10008-014-2616-7
M3 - Artículo
SN - 1432-8488
VL - 19
SP - 423
EP - 433
JO - Journal of Solid State Electrochemistry
JF - Journal of Solid State Electrochemistry
IS - 2
ER -