Effect of deposition parameters on structural, mechanical and electrochemical properties in Ti/TiN thin films on AISI 316L substrates produced by r. f. magnetron sputtering

M. A. Domínguez-Crespo, A. M. Torres-Huerta, E. Rodríguez, A. González-Hernández, S. B. Brachetti-Sibaja, H. J. Dorantes-Rosales, A. B. López-Oyama

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