Cu4O3 thin films deposited by non-reactive rf-magnetron sputtering from a copper oxide target

Cruz M.A. Almazán; Vigueras E. Santiago; R. López; Hernández S. López; Hugo Castrejón V. Sánchez; A. Esparza; Encarnación C. Gómez

doi:10.31349/RevMexFis.67.495

Cu₄O₃ thin films deposited by non-reactive rf-magnetron sputtering from a copper oxide target

Cruz M.A. Almazán, Vigueras E. Santiago, R. López, Hernández S. López, Hugo Castrejón V. Sánchez, A. Esparza, Encarnación C. Gómez

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

Copper oxide thin films deposited by sputtering are frequently formed by using metal copper targets in reactive atmospheres. In this report, paramelaconite (Cu4O3) thin films were deposited by non-reactive rf magnetron sputtering. The target used for sputtering was a copper oxide disk fabricated by oxidation of metal copper at 1000±C for 24 h in the air atmosphere. X-ray diffraction (XRD) results showed that the copper oxide target was mainly composed of cupric oxide (CuO) and cuprous oxide (Cu2O) crystals. Raman analyses suggested that the surface of the copper oxide disk is composed of a (CuO) layer. XRD measurements performed to the copper oxide thin films deposited by non-reactive rf magnetron sputtering showed that the film is composed of (Cu4O3) crystals. However, Raman measurements indicated that the Cu4O3 thin films are also composed of amorphous CuO and Cu2O.

Original language	English
Pages (from-to)	495-499
Number of pages	5
Journal	Revista Mexicana de Fisica
Volume	67
Issue number	3
DOIs	https://doi.org/10.31349/RevMexFis.67.495
State	Published - May 2021
Externally published	Yes

Keywords

Cu4O3
Paramelaconite
non reactive sputtering
thermal oxidation

Access to Document

10.31349/RevMexFis.67.495

Cite this

@article{6e706eab4fe048e099e7bfa82cf53dfe,

title = "Cu4O3 thin films deposited by non-reactive rf-magnetron sputtering from a copper oxide target",

abstract = "Copper oxide thin films deposited by sputtering are frequently formed by using metal copper targets in reactive atmospheres. In this report, paramelaconite (Cu4O3) thin films were deposited by non-reactive rf magnetron sputtering. The target used for sputtering was a copper oxide disk fabricated by oxidation of metal copper at 1000±C for 24 h in the air atmosphere. X-ray diffraction (XRD) results showed that the copper oxide target was mainly composed of cupric oxide (CuO) and cuprous oxide (Cu2O) crystals. Raman analyses suggested that the surface of the copper oxide disk is composed of a (CuO) layer. XRD measurements performed to the copper oxide thin films deposited by non-reactive rf magnetron sputtering showed that the film is composed of (Cu4O3) crystals. However, Raman measurements indicated that the Cu4O3 thin films are also composed of amorphous CuO and Cu2O.",

keywords = "Cu4O3, Paramelaconite, non reactive sputtering, thermal oxidation",

author = "Almaz{\'a}n, {Cruz M.A.} and Santiago, {Vigueras E.} and R. L{\'o}pez and L{\'o}pez, {Hern{\'a}ndez S.} and S{\'a}nchez, {Hugo Castrej{\'o}n V.} and A. Esparza and G{\'o}mez, {Encarnaci{\'o}n C.}",

year = "2021",

month = may,

doi = "10.31349/RevMexFis.67.495",

language = "Ingl{\'e}s",

volume = "67",

pages = "495--499",

journal = "Revista Mexicana de Fisica",

issn = "0035-001X",

number = "3",

}

TY - JOUR

T1 - Cu4O3 thin films deposited by non-reactive rf-magnetron sputtering from a copper oxide target

AU - Almazán, Cruz M.A.

AU - Santiago, Vigueras E.

AU - López, R.

AU - López, Hernández S.

AU - Sánchez, Hugo Castrejón V.

AU - Esparza, A.

AU - Gómez, Encarnación C.

PY - 2021/5

Y1 - 2021/5

N2 - Copper oxide thin films deposited by sputtering are frequently formed by using metal copper targets in reactive atmospheres. In this report, paramelaconite (Cu4O3) thin films were deposited by non-reactive rf magnetron sputtering. The target used for sputtering was a copper oxide disk fabricated by oxidation of metal copper at 1000±C for 24 h in the air atmosphere. X-ray diffraction (XRD) results showed that the copper oxide target was mainly composed of cupric oxide (CuO) and cuprous oxide (Cu2O) crystals. Raman analyses suggested that the surface of the copper oxide disk is composed of a (CuO) layer. XRD measurements performed to the copper oxide thin films deposited by non-reactive rf magnetron sputtering showed that the film is composed of (Cu4O3) crystals. However, Raman measurements indicated that the Cu4O3 thin films are also composed of amorphous CuO and Cu2O.

AB - Copper oxide thin films deposited by sputtering are frequently formed by using metal copper targets in reactive atmospheres. In this report, paramelaconite (Cu4O3) thin films were deposited by non-reactive rf magnetron sputtering. The target used for sputtering was a copper oxide disk fabricated by oxidation of metal copper at 1000±C for 24 h in the air atmosphere. X-ray diffraction (XRD) results showed that the copper oxide target was mainly composed of cupric oxide (CuO) and cuprous oxide (Cu2O) crystals. Raman analyses suggested that the surface of the copper oxide disk is composed of a (CuO) layer. XRD measurements performed to the copper oxide thin films deposited by non-reactive rf magnetron sputtering showed that the film is composed of (Cu4O3) crystals. However, Raman measurements indicated that the Cu4O3 thin films are also composed of amorphous CuO and Cu2O.

KW - Cu4O3

KW - Paramelaconite

KW - non reactive sputtering

KW - thermal oxidation

UR - http://www.scopus.com/inward/record.url?scp=85105786305&partnerID=8YFLogxK

U2 - 10.31349/RevMexFis.67.495

DO - 10.31349/RevMexFis.67.495

M3 - Artículo

AN - SCOPUS:85105786305

SN - 0035-001X

VL - 67

SP - 495

EP - 499

JO - Revista Mexicana de Fisica

JF - Revista Mexicana de Fisica

IS - 3

ER -

Cu₄O₃ thin films deposited by non-reactive rf-magnetron sputtering from a copper oxide target

Abstract

Keywords

Access to Document

Other files and links

Fingerprint

Cite this