Comparison of the optical and structural properties of nickel oxide-based thin films obtained by chemical bath and sputtering

A. Mendoza-Galván; M. A. Vidales-Hurtado; A. M. López-Beltrán

doi:10.1016/j.tsf.2008.11.094

Comparison of the optical and structural properties of nickel oxide-based thin films obtained by chemical bath and sputtering

A. Mendoza-Galván, M. A. Vidales-Hurtado, A. M. López-Beltrán

Research output: Contribution to journal › Article › peer-review

40 Scopus citations

Abstract

Nickel oxide thin films were prepared using chemical bath deposition and reactive magnetron dc-sputtering. Through the chemical route, Ni(OH)₂ films were deposited with a nano-porous structure providing large specific surface area. Subsequent annealing at 300 °C transformed the films into NiO. These films showed high absorption in the visible range and low crystallinity due to Ni vacancies. Annealing at higher temperatures removes Ni vacancies improving transmittance and crystallinity. Sputtered films were obtained in Ar + O₂ and Ar + H₂ + O₂ atmospheres at different flux ratios. During deposition in the former atmosphere, substrate temperature was 300 °C producing dense polycrystalline films with excellent optical properties. In the hydrogen containing atmosphere, the substrate was at room temperature and polycrystalline films with a dark-yellowish color and expanded lattice were obtained.

Original language	English
Pages (from-to)	3115-3120
Number of pages	6
Journal	Thin Solid Films
Volume	517
Issue number	10
DOIs	https://doi.org/10.1016/j.tsf.2008.11.094
State	Published - 31 Mar 2009
Externally published	Yes

Keywords

Chemical deposition
Nickel oxide
Optical properties
Sputtering

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10.1016/j.tsf.2008.11.094

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abstract = "Nickel oxide thin films were prepared using chemical bath deposition and reactive magnetron dc-sputtering. Through the chemical route, Ni(OH)2 films were deposited with a nano-porous structure providing large specific surface area. Subsequent annealing at 300 °C transformed the films into NiO. These films showed high absorption in the visible range and low crystallinity due to Ni vacancies. Annealing at higher temperatures removes Ni vacancies improving transmittance and crystallinity. Sputtered films were obtained in Ar + O2 and Ar + H2 + O2 atmospheres at different flux ratios. During deposition in the former atmosphere, substrate temperature was 300 °C producing dense polycrystalline films with excellent optical properties. In the hydrogen containing atmosphere, the substrate was at room temperature and polycrystalline films with a dark-yellowish color and expanded lattice were obtained.",

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AU - Mendoza-Galván, A.

AU - Vidales-Hurtado, M. A.

AU - López-Beltrán, A. M.

PY - 2009/3/31

Y1 - 2009/3/31

N2 - Nickel oxide thin films were prepared using chemical bath deposition and reactive magnetron dc-sputtering. Through the chemical route, Ni(OH)2 films were deposited with a nano-porous structure providing large specific surface area. Subsequent annealing at 300 °C transformed the films into NiO. These films showed high absorption in the visible range and low crystallinity due to Ni vacancies. Annealing at higher temperatures removes Ni vacancies improving transmittance and crystallinity. Sputtered films were obtained in Ar + O2 and Ar + H2 + O2 atmospheres at different flux ratios. During deposition in the former atmosphere, substrate temperature was 300 °C producing dense polycrystalline films with excellent optical properties. In the hydrogen containing atmosphere, the substrate was at room temperature and polycrystalline films with a dark-yellowish color and expanded lattice were obtained.

AB - Nickel oxide thin films were prepared using chemical bath deposition and reactive magnetron dc-sputtering. Through the chemical route, Ni(OH)2 films were deposited with a nano-porous structure providing large specific surface area. Subsequent annealing at 300 °C transformed the films into NiO. These films showed high absorption in the visible range and low crystallinity due to Ni vacancies. Annealing at higher temperatures removes Ni vacancies improving transmittance and crystallinity. Sputtered films were obtained in Ar + O2 and Ar + H2 + O2 atmospheres at different flux ratios. During deposition in the former atmosphere, substrate temperature was 300 °C producing dense polycrystalline films with excellent optical properties. In the hydrogen containing atmosphere, the substrate was at room temperature and polycrystalline films with a dark-yellowish color and expanded lattice were obtained.

KW - Chemical deposition

KW - Nickel oxide

KW - Optical properties

KW - Sputtering

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DO - 10.1016/j.tsf.2008.11.094

M3 - Artículo

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SP - 3115

EP - 3120

JO - Thin Solid Films

JF - Thin Solid Films

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Comparison of the optical and structural properties of nickel oxide-based thin films obtained by chemical bath and sputtering

Abstract

Keywords

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