TY - JOUR
T1 - Comparative study of the p+ layer created in CdTe films by nitric-phosphoric etching and chemical-deposition methods
AU - Vigil, Osvaldo
AU - Ochoa-Landín, Ramón
AU - Fandiño, Jesús
AU - Cruz-Gandarilla, Francisco
PY - 2010/3
Y1 - 2010/3
N2 - The physical properties of the etched CdTe surfaces obtained during the process of formation of a p+ region on CdTe surface films using (i) a nitric/phosphoric acid mixture and (ii) a chemical Te-deposition method involving thermal annealing have been compared in this study. This study suggests the chemical-deposition method as an alternative to the chemical-etching methods for use in back-contact technology to increase the efficiency of CdTe solar cells.
AB - The physical properties of the etched CdTe surfaces obtained during the process of formation of a p+ region on CdTe surface films using (i) a nitric/phosphoric acid mixture and (ii) a chemical Te-deposition method involving thermal annealing have been compared in this study. This study suggests the chemical-deposition method as an alternative to the chemical-etching methods for use in back-contact technology to increase the efficiency of CdTe solar cells.
KW - A. semiconductors
KW - A. thin films
KW - D. electrical properties
UR - http://www.scopus.com/inward/record.url?scp=77049083827&partnerID=8YFLogxK
U2 - 10.1016/j.jpcs.2009.10.010
DO - 10.1016/j.jpcs.2009.10.010
M3 - Artículo
SN - 0022-3697
VL - 71
SP - 404
EP - 406
JO - Journal of Physics and Chemistry of Solids
JF - Journal of Physics and Chemistry of Solids
IS - 3
ER -