Characteristics of ZnO:Cr thin films deposited by spray pyrolysis

A. Maldonado; M. De La L. Olvera; R. Asomoza; S. Tirado-Guerra

doi:10.1116/1.1287444

Characteristics of ZnO:Cr thin films deposited by spray pyrolysis

A. Maldonado, M. De La L. Olvera, R. Asomoza, S. Tirado-Guerra

Escuela Superior de Física y Matemáticas (ESFM)

Research output: Contribution to journal › Conference article › peer-review

9 Scopus citations

Abstract

Spray pyrolysis technique was used to deposit chromium-doped zinc oxide thin films. 15 at. % of chromium in solution was used. A low etching rate on ZnO:Cr thin films was obtained as compared to undoped ZnO under diluted HCl. A high resistivity is shown by As-deposited and vacuum-annealed films. X ray diffraction do not show the presence of extra phases. A low incorporation efficiency of chromium into the ZnO films is observed. The films are adequate for transparent and protective coatings because of high transmittance.

Original language	English
Pages (from-to)	2098-2101
Number of pages	4
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	18
Issue number	5
DOIs	https://doi.org/10.1116/1.1287444
State	Published - Sep 2000
Event	47th International Symposium: Vacuum, Thin Films, Surfaces/Interfaces, and Processing - Boston, USA Duration: 2 Oct 2000 → 6 Oct 2000

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title = "Characteristics of ZnO:Cr thin films deposited by spray pyrolysis",

abstract = "Spray pyrolysis technique was used to deposit chromium-doped zinc oxide thin films. 15 at. % of chromium in solution was used. A low etching rate on ZnO:Cr thin films was obtained as compared to undoped ZnO under diluted HCl. A high resistivity is shown by As-deposited and vacuum-annealed films. X ray diffraction do not show the presence of extra phases. A low incorporation efficiency of chromium into the ZnO films is observed. The films are adequate for transparent and protective coatings because of high transmittance.",

author = "A. Maldonado and Olvera, {M. De La L.} and R. Asomoza and S. Tirado-Guerra",

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note = "47th International Symposium: Vacuum, Thin Films, Surfaces/Interfaces, and Processing ; Conference date: 02-10-2000 Through 06-10-2000",

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T1 - Characteristics of ZnO:Cr thin films deposited by spray pyrolysis

AU - Maldonado, A.

AU - Olvera, M. De La L.

AU - Asomoza, R.

AU - Tirado-Guerra, S.

PY - 2000/9

Y1 - 2000/9

N2 - Spray pyrolysis technique was used to deposit chromium-doped zinc oxide thin films. 15 at. % of chromium in solution was used. A low etching rate on ZnO:Cr thin films was obtained as compared to undoped ZnO under diluted HCl. A high resistivity is shown by As-deposited and vacuum-annealed films. X ray diffraction do not show the presence of extra phases. A low incorporation efficiency of chromium into the ZnO films is observed. The films are adequate for transparent and protective coatings because of high transmittance.

AB - Spray pyrolysis technique was used to deposit chromium-doped zinc oxide thin films. 15 at. % of chromium in solution was used. A low etching rate on ZnO:Cr thin films was obtained as compared to undoped ZnO under diluted HCl. A high resistivity is shown by As-deposited and vacuum-annealed films. X ray diffraction do not show the presence of extra phases. A low incorporation efficiency of chromium into the ZnO films is observed. The films are adequate for transparent and protective coatings because of high transmittance.

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U2 - 10.1116/1.1287444

DO - 10.1116/1.1287444

M3 - Artículo de la conferencia

SN - 0734-2101

VL - 18

SP - 2098

EP - 2101

JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

IS - 5

T2 - 47th International Symposium: Vacuum, Thin Films, Surfaces/Interfaces, and Processing

Y2 - 2 October 2000 through 6 October 2000

ER -

Characteristics of ZnO:Cr thin films deposited by spray pyrolysis

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