AC bipolar pulsed power supply for reactive magnetron sputtering

J. García-García; J. Pacheco-Sotelo; R. Valdivia-Barrientos; Carlos Rivera-Rodríguez; M. Pacheco-Pacheco; Jean Jacques Gonzalez; M. Nieto-Pérez

doi:10.1109/TPS.2011.2162592

AC bipolar pulsed power supply for reactive magnetron sputtering

J. García-García, J. Pacheco-Sotelo, R. Valdivia-Barrientos, Carlos Rivera-Rodríguez, M. Pacheco-Pacheco, Jean Jacques Gonzalez, M. Nieto-Pérez

Centro de Investigación en Ciencia Aplicada y Tecnología Avanzada (CICATA), Unidad Querétaro

Research output: Contribution to journal › Article › peer-review

4 Scopus citations

Abstract

This paper presents an ac bipolar pulsed power supply, which is used to drive a magnetron sputtering reactor operating under reactive atmosphere. The power supply was tested for the deposition of thin films of ZnO:Al on glass and plastic substrates. Voltage, current, and optical spectroscopy measurements were performed during the discharge. The electrical aspects of the ac bipolar pulsed magnetron discharge operating with reactive gases at pressures below 0.066 kPa are discussed. To characterize the power transferred to the plasma, electrical parameters are measured with calibrated current and voltage probes. The rate of deposition and their characteristics are also discussed.

Original language	English
Article number	6004836
Pages (from-to)	1983-1989
Number of pages	7
Journal	IEEE Transactions on Plasma Science
Volume	39
Issue number	10
DOIs	https://doi.org/10.1109/TPS.2011.2162592
State	Published - Oct 2011

Keywords

Flexible substrate
high rate deposition
thick film
transparent conductive oxide (TCO)

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10.1109/TPS.2011.2162592

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title = "AC bipolar pulsed power supply for reactive magnetron sputtering",

abstract = "This paper presents an ac bipolar pulsed power supply, which is used to drive a magnetron sputtering reactor operating under reactive atmosphere. The power supply was tested for the deposition of thin films of ZnO:Al on glass and plastic substrates. Voltage, current, and optical spectroscopy measurements were performed during the discharge. The electrical aspects of the ac bipolar pulsed magnetron discharge operating with reactive gases at pressures below 0.066 kPa are discussed. To characterize the power transferred to the plasma, electrical parameters are measured with calibrated current and voltage probes. The rate of deposition and their characteristics are also discussed.",

keywords = "Flexible substrate, high rate deposition, thick film, transparent conductive oxide (TCO)",

author = "J. Garc{\'i}a-Garc{\'i}a and J. Pacheco-Sotelo and R. Valdivia-Barrientos and Carlos Rivera-Rodr{\'i}guez and M. Pacheco-Pacheco and Gonzalez, {Jean Jacques} and M. Nieto-P{\'e}rez",

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T1 - AC bipolar pulsed power supply for reactive magnetron sputtering

AU - García-García, J.

AU - Pacheco-Sotelo, J.

AU - Valdivia-Barrientos, R.

AU - Rivera-Rodríguez, Carlos

AU - Pacheco-Pacheco, M.

AU - Gonzalez, Jean Jacques

AU - Nieto-Pérez, M.

PY - 2011/10

Y1 - 2011/10

N2 - This paper presents an ac bipolar pulsed power supply, which is used to drive a magnetron sputtering reactor operating under reactive atmosphere. The power supply was tested for the deposition of thin films of ZnO:Al on glass and plastic substrates. Voltage, current, and optical spectroscopy measurements were performed during the discharge. The electrical aspects of the ac bipolar pulsed magnetron discharge operating with reactive gases at pressures below 0.066 kPa are discussed. To characterize the power transferred to the plasma, electrical parameters are measured with calibrated current and voltage probes. The rate of deposition and their characteristics are also discussed.

AB - This paper presents an ac bipolar pulsed power supply, which is used to drive a magnetron sputtering reactor operating under reactive atmosphere. The power supply was tested for the deposition of thin films of ZnO:Al on glass and plastic substrates. Voltage, current, and optical spectroscopy measurements were performed during the discharge. The electrical aspects of the ac bipolar pulsed magnetron discharge operating with reactive gases at pressures below 0.066 kPa are discussed. To characterize the power transferred to the plasma, electrical parameters are measured with calibrated current and voltage probes. The rate of deposition and their characteristics are also discussed.

KW - Flexible substrate

KW - high rate deposition

KW - thick film

KW - transparent conductive oxide (TCO)

UR - http://www.scopus.com/inward/record.url?scp=80054061006&partnerID=8YFLogxK

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DO - 10.1109/TPS.2011.2162592

M3 - Artículo

AN - SCOPUS:80054061006

SN - 0093-3813

VL - 39

SP - 1983

EP - 1989

JO - IEEE Transactions on Plasma Science

JF - IEEE Transactions on Plasma Science

IS - 10

M1 - 6004836

ER -

AC bipolar pulsed power supply for reactive magnetron sputtering

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Keywords

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