Engineering & Materials Science
Aluminum
26%
Aluminum oxide
20%
Amorphous silicon
19%
Annealing
34%
Cadmium
20%
Cadmium sulfide
96%
Chemical vapor deposition
36%
Contact resistance
17%
Crystalline materials
37%
Current density
19%
Diodes
53%
Electric properties
36%
Electrodes
16%
Energy gap
18%
Fabrication
28%
Gallium
22%
Glass
18%
Green Synthesis
41%
Heterojunctions
28%
Indium
54%
Interface states
16%
Ions
17%
Nanoparticles
21%
Nanorods
18%
Optical properties
29%
Oxide films
57%
Oxides
20%
Passivation
23%
Photodetectors
26%
Photoelectricity
17%
Photolithography
34%
Polyimides
18%
Pulsed laser deposition
86%
Schottky barrier diodes
47%
Semiconductor materials
32%
Silicon
31%
Silicon solar cells
28%
Solar cells
57%
Sputtering
22%
Structural properties
36%
Substrates
45%
Sulfur
16%
Temperature
59%
Thermionic emission
21%
Thin film transistors
100%
Thin films
96%
Threshold voltage
19%
Tin oxides
23%
X ray photoelectron spectroscopy
27%
Zinc oxide
90%
Physics & Astronomy
aluminum
24%
AMPS (satellite payload)
17%
anatase
11%
annealing
14%
cadmium
15%
cadmium sulfides
65%
cadmium tellurides
13%
carbon
16%
chemical properties
10%
contact resistance
15%
defects
11%
electric contacts
12%
electrical properties
24%
electrical resistivity
14%
electrodes
12%
fabrication
12%
gallium oxides
16%
glass
11%
hydrogenation
11%
indium
21%
indium oxides
13%
inverters
12%
ITO (semiconductors)
12%
metal oxides
13%
n-type semiconductors
14%
nanoparticles
14%
nanorods
11%
nitrogen
11%
optical properties
15%
oxide films
19%
oxygen
13%
p-i-n diodes
13%
passivity
11%
photoelectron spectroscopy
12%
photolithography
19%
photometers
18%
polyimides
10%
pulsed laser deposition
52%
room temperature
14%
Schottky diodes
43%
solar cells
16%
sputtering
13%
sulfur
16%
synthesis
15%
tellurides
13%
thin films
79%
tin oxides
13%
transistors
51%
zinc oxides
62%
zinc tellurides
14%
Chemistry
5-Hydroxymethylfurfural
13%
Amorphous Material
14%
Annealing
19%
Application
8%
Band Gap
14%
Behavior as Electrode
10%
Cadmium Sulfide
65%
Chemical Passivation
16%
Compound Mobility
8%
Contact Resistance
18%
Current Density
10%
Density of Interface States
19%
Deposition Technique
17%
Electrical Property
26%
Gas
10%
Glass Substrate
30%
Hot Filament Vapor Deposition
14%
Interfacial Defect
8%
Ion
8%
Liquid Film
61%
Mechanical Stress
13%
Metal Oxide
13%
Nanofilm
12%
Nanoparticle
11%
Nanorod
10%
Optical Property
16%
Oxide
13%
Photoelectricity
11%
Polyimide Macromolecule
15%
Pressure
14%
Pulsed Laser Deposition
73%
Reflectivity
12%
Rod Like Crystal
9%
Schottky Barrier
42%
Schottky Contact
31%
Semiconductor
28%
Simulation
18%
Solar Cell
35%
Sputtering
16%
Tannic Acid
13%
Thermionic Emission
22%
Time
8%
Titanium Dioxide
8%
Transmittance
8%
Trap Density Measurement
15%
Visible Spectrum
13%
Voltage
16%
Work Function
19%
X-Ray Photoelectron Spectroscopy
9%
Zinc Oxide
57%