Development of ZnO/Ta 2O 5 heterojunction using low-temperature technological processes

R. Baca, J. A. Andraca, M. G. Arellano, G. R. Paredes, R. P. Sierra

Producción científica: Capítulo del libro/informe/acta de congresoContribución a la conferenciarevisión exhaustiva

Resumen

ZnO/Ta 2O 5 heterojunctions were formed on glass substrates using low temperature processes. Formerly insulating Ta 2O 5 films were deposited on glass substrates by vacuum evaporation using Ta 2O 5 powder, Afterwards transparent and conductive ZnO films were formed on the Ta 2O 5 films by thermal oxidation at 320°C in air atmosphere of zinc (Zn) films deposited by dc sputtering process. Structural and optical properties of ZnO were investigated by X-ray diffraction (XRD) and photoluminescence (PL). The Ta 2O 5 insulating films were characterized by Raman scattering. The ZnO/Ta 2O 5 heterojunction was characterized by current-voltage measurements at room temperature as well as transient response under a rectangular-pulse voltage source. The electrical and the transient response suggest that the ZnO/Ta 2O 5 heterojunction is a potential alternative for the fabrication of alternating-current-driven thin film electroluminescent (ACTFEL) devices.

Idioma originalInglés
Título de la publicación alojadaLow-Temperature-Processed Thin-Film Transistors
Páginas51-56
Número de páginas6
DOI
EstadoPublicada - 2011
Publicado de forma externa
Evento2010 MRS Fall Meeting - Boston, MA, Estados Unidos
Duración: 29 nov. 20103 dic. 2010

Serie de la publicación

NombreMaterials Research Society Symposium Proceedings
Volumen1287
ISSN (versión impresa)0272-9172

Conferencia

Conferencia2010 MRS Fall Meeting
País/TerritorioEstados Unidos
CiudadBoston, MA
Período29/11/103/12/10

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