TY - JOUR
T1 - Transmittance, Absorbance and Emission of Ga related Defects in Ga-doped ZnO Nanocrystal Films
AU - Torchynska, Tetyana V.
AU - El Filali, Brahim
AU - Casas Espinola, Jose L.
AU - Ballardo Rodriguez, Chetzyl I.
AU - Polupan, Georgiy
AU - Shcherbyna, Lyudmyla
N1 - Publisher Copyright:
Copyright © The Author(s), 2020, published on behalf of Materials Research Society by Cambridge University Press.
PY - 2020
Y1 - 2020
N2 - ZnO films grown by ultrasonic spray pyrolysis with different Ga contents in the range of 1.0-6.5 at% on quartz substrates have been studied. The ZnO:Ga films were annealed at 400°C for 4h in a nitrogen flow. Morphology, emission, transmittance, absorbance and electrical resistivity were controlled. It is revealed that with a small content of Ga ≤ 4.0 at%, the ZnO:Ga films maintain a flat morphology, their transmittance increases to 86% together with the increase of the ZnO optical bandgap to 3.28 eV and the intensity enlargement of the near band edge (NBE) emission band A (3.188 eV). Furthermore, the new NBE emission band B (3.072 eV) appears in photoluminescence (PL) spectra at Ga contents ≥ 1.5 at%. Simultaneously, the process of decreasing electrical resistivity becomes saturating. The last effect is attributed to the self-compensation effect in n-type ZnO:Ga films related to the generation of acceptor type complexes (VZn2-GaZn+). The thermal quenching of the PL intensities of the A and B PL bands is studded at 18-290K, which allows assigning the PL band A to the LO-phonon replica of the free exciton emission and the band B to the emission in donor-acceptor pairs: Shallow donors- A cceptor complexes (VZn2-GaZn+). The NBE emission intensity drops and the ZnO optical bandgap demonstrates the shift to a lower energy at Ga doping up to ≤ 6.5 at%. Optimal Ga concentrations have been estimated to produce ZnO:Ga films with flat morphology, high optical transmittance and bright NBE emission.
AB - ZnO films grown by ultrasonic spray pyrolysis with different Ga contents in the range of 1.0-6.5 at% on quartz substrates have been studied. The ZnO:Ga films were annealed at 400°C for 4h in a nitrogen flow. Morphology, emission, transmittance, absorbance and electrical resistivity were controlled. It is revealed that with a small content of Ga ≤ 4.0 at%, the ZnO:Ga films maintain a flat morphology, their transmittance increases to 86% together with the increase of the ZnO optical bandgap to 3.28 eV and the intensity enlargement of the near band edge (NBE) emission band A (3.188 eV). Furthermore, the new NBE emission band B (3.072 eV) appears in photoluminescence (PL) spectra at Ga contents ≥ 1.5 at%. Simultaneously, the process of decreasing electrical resistivity becomes saturating. The last effect is attributed to the self-compensation effect in n-type ZnO:Ga films related to the generation of acceptor type complexes (VZn2-GaZn+). The thermal quenching of the PL intensities of the A and B PL bands is studded at 18-290K, which allows assigning the PL band A to the LO-phonon replica of the free exciton emission and the band B to the emission in donor-acceptor pairs: Shallow donors- A cceptor complexes (VZn2-GaZn+). The NBE emission intensity drops and the ZnO optical bandgap demonstrates the shift to a lower energy at Ga doping up to ≤ 6.5 at%. Optimal Ga concentrations have been estimated to produce ZnO:Ga films with flat morphology, high optical transmittance and bright NBE emission.
UR - http://www.scopus.com/inward/record.url?scp=85096021009&partnerID=8YFLogxK
U2 - 10.1557/adv.2020.403
DO - 10.1557/adv.2020.403
M3 - Artículo
AN - SCOPUS:85096021009
SN - 2059-8521
JO - MRS Advances
JF - MRS Advances
ER -