Titanium oxidation by rf inductively coupled plasma

R. Valencia-Alvarado, A. De La Piedad-Beneitez, R. López-Callejas, S. R. Barocio, A. Mercado-Cabrera, R. Peña-Eguiluz, A. E. Muñoz-Castro, B. G. Rodríguez-Méndez, J. M. De La Rosa-Vázquez

Research output: Contribution to conferencePaper

1 Citation (Scopus)

Abstract

The development of titanium dioxide (TiO2) films in the rutile and anatase phases is reported. The films have been obtained from an implantation/diffusion and sputtering process of commercially pure titanium targets, carried out in up to 500 W plasmas. The experimental outcome is of particular interest, in the case of anatase, for atmospheric pollution degradation by photocatalysis and, as to the rutile phase, for the production of biomaterials required by prosthesis and implants. The reactor employed consists in a cylindrical pyrex-like glass vessel inductively coupled to a 13.56 MHz RF source. The process takes place at a 5×10-2 mbar pressure with the target samples being biased from 0 to -3000 V DC. The anatase phase films were obtained from sputtering the titanium targets over glass and silicon electrically floated substrates placed 2 cm away from the target. The rutile phase was obtained by implantation/ diffusion on targets at about 700 °C. The plasma was developed from a 4:1 argon/oxygen mixture for ∼5 hour processing periods. The target temperature was controlled by means of the bias voltage and the plasma source power. The obtained anatase phases did not require annealing after the plasma oxidation process. The characterization of the film samples was conducted by means of x-ray diffraction, scanning electron microscopy, x-ray photoelectron spectroscopy and Raman spectroscopy.
Original languageAmerican English
DOIs
StatePublished - 1 Jan 2014
Externally publishedYes
EventJournal of Physics: Conference Series -
Duration: 8 Mar 2017 → …

Conference

ConferenceJournal of Physics: Conference Series
Period8/03/17 → …

Fingerprint

titanium
anatase
oxidation
rutile
implantation
plasma power sources
sputtering
glass
borosilicate glass
pollution
titanium oxides
x ray spectroscopy
vessels
x ray diffraction
Raman spectroscopy
direct current
reactors
argon
photoelectron spectroscopy
degradation

Cite this

Valencia-Alvarado, R., De La Piedad-Beneitez, A., López-Callejas, R., Barocio, S. R., Mercado-Cabrera, A., Peña-Eguiluz, R., ... De La Rosa-Vázquez, J. M. (2014). Titanium oxidation by rf inductively coupled plasma. Paper presented at Journal of Physics: Conference Series, . https://doi.org/10.1088/1742-6596/511/1/012077
Valencia-Alvarado, R. ; De La Piedad-Beneitez, A. ; López-Callejas, R. ; Barocio, S. R. ; Mercado-Cabrera, A. ; Peña-Eguiluz, R. ; Muñoz-Castro, A. E. ; Rodríguez-Méndez, B. G. ; De La Rosa-Vázquez, J. M. / Titanium oxidation by rf inductively coupled plasma. Paper presented at Journal of Physics: Conference Series, .
@conference{417cc217f6864b9e9b68df4b99dc3913,
title = "Titanium oxidation by rf inductively coupled plasma",
abstract = "The development of titanium dioxide (TiO2) films in the rutile and anatase phases is reported. The films have been obtained from an implantation/diffusion and sputtering process of commercially pure titanium targets, carried out in up to 500 W plasmas. The experimental outcome is of particular interest, in the case of anatase, for atmospheric pollution degradation by photocatalysis and, as to the rutile phase, for the production of biomaterials required by prosthesis and implants. The reactor employed consists in a cylindrical pyrex-like glass vessel inductively coupled to a 13.56 MHz RF source. The process takes place at a 5×10-2 mbar pressure with the target samples being biased from 0 to -3000 V DC. The anatase phase films were obtained from sputtering the titanium targets over glass and silicon electrically floated substrates placed 2 cm away from the target. The rutile phase was obtained by implantation/ diffusion on targets at about 700 °C. The plasma was developed from a 4:1 argon/oxygen mixture for ∼5 hour processing periods. The target temperature was controlled by means of the bias voltage and the plasma source power. The obtained anatase phases did not require annealing after the plasma oxidation process. The characterization of the film samples was conducted by means of x-ray diffraction, scanning electron microscopy, x-ray photoelectron spectroscopy and Raman spectroscopy.",
author = "R. Valencia-Alvarado and {De La Piedad-Beneitez}, A. and R. L{\'o}pez-Callejas and Barocio, {S. R.} and A. Mercado-Cabrera and R. Pe{\~n}a-Eguiluz and Mu{\~n}oz-Castro, {A. E.} and Rodr{\'i}guez-M{\'e}ndez, {B. G.} and {De La Rosa-V{\'a}zquez}, {J. M.}",
year = "2014",
month = "1",
day = "1",
doi = "10.1088/1742-6596/511/1/012077",
language = "American English",
note = "Journal of Physics: Conference Series ; Conference date: 08-03-2017",

}

Valencia-Alvarado, R, De La Piedad-Beneitez, A, López-Callejas, R, Barocio, SR, Mercado-Cabrera, A, Peña-Eguiluz, R, Muñoz-Castro, AE, Rodríguez-Méndez, BG & De La Rosa-Vázquez, JM 2014, 'Titanium oxidation by rf inductively coupled plasma', Paper presented at Journal of Physics: Conference Series, 8/03/17. https://doi.org/10.1088/1742-6596/511/1/012077

Titanium oxidation by rf inductively coupled plasma. / Valencia-Alvarado, R.; De La Piedad-Beneitez, A.; López-Callejas, R.; Barocio, S. R.; Mercado-Cabrera, A.; Peña-Eguiluz, R.; Muñoz-Castro, A. E.; Rodríguez-Méndez, B. G.; De La Rosa-Vázquez, J. M.

2014. Paper presented at Journal of Physics: Conference Series, .

Research output: Contribution to conferencePaper

TY - CONF

T1 - Titanium oxidation by rf inductively coupled plasma

AU - Valencia-Alvarado, R.

AU - De La Piedad-Beneitez, A.

AU - López-Callejas, R.

AU - Barocio, S. R.

AU - Mercado-Cabrera, A.

AU - Peña-Eguiluz, R.

AU - Muñoz-Castro, A. E.

AU - Rodríguez-Méndez, B. G.

AU - De La Rosa-Vázquez, J. M.

PY - 2014/1/1

Y1 - 2014/1/1

N2 - The development of titanium dioxide (TiO2) films in the rutile and anatase phases is reported. The films have been obtained from an implantation/diffusion and sputtering process of commercially pure titanium targets, carried out in up to 500 W plasmas. The experimental outcome is of particular interest, in the case of anatase, for atmospheric pollution degradation by photocatalysis and, as to the rutile phase, for the production of biomaterials required by prosthesis and implants. The reactor employed consists in a cylindrical pyrex-like glass vessel inductively coupled to a 13.56 MHz RF source. The process takes place at a 5×10-2 mbar pressure with the target samples being biased from 0 to -3000 V DC. The anatase phase films were obtained from sputtering the titanium targets over glass and silicon electrically floated substrates placed 2 cm away from the target. The rutile phase was obtained by implantation/ diffusion on targets at about 700 °C. The plasma was developed from a 4:1 argon/oxygen mixture for ∼5 hour processing periods. The target temperature was controlled by means of the bias voltage and the plasma source power. The obtained anatase phases did not require annealing after the plasma oxidation process. The characterization of the film samples was conducted by means of x-ray diffraction, scanning electron microscopy, x-ray photoelectron spectroscopy and Raman spectroscopy.

AB - The development of titanium dioxide (TiO2) films in the rutile and anatase phases is reported. The films have been obtained from an implantation/diffusion and sputtering process of commercially pure titanium targets, carried out in up to 500 W plasmas. The experimental outcome is of particular interest, in the case of anatase, for atmospheric pollution degradation by photocatalysis and, as to the rutile phase, for the production of biomaterials required by prosthesis and implants. The reactor employed consists in a cylindrical pyrex-like glass vessel inductively coupled to a 13.56 MHz RF source. The process takes place at a 5×10-2 mbar pressure with the target samples being biased from 0 to -3000 V DC. The anatase phase films were obtained from sputtering the titanium targets over glass and silicon electrically floated substrates placed 2 cm away from the target. The rutile phase was obtained by implantation/ diffusion on targets at about 700 °C. The plasma was developed from a 4:1 argon/oxygen mixture for ∼5 hour processing periods. The target temperature was controlled by means of the bias voltage and the plasma source power. The obtained anatase phases did not require annealing after the plasma oxidation process. The characterization of the film samples was conducted by means of x-ray diffraction, scanning electron microscopy, x-ray photoelectron spectroscopy and Raman spectroscopy.

UR - https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84901610081&origin=inward

UR - https://www.scopus.com/inward/citedby.uri?partnerID=HzOxMe3b&scp=84901610081&origin=inward

U2 - 10.1088/1742-6596/511/1/012077

DO - 10.1088/1742-6596/511/1/012077

M3 - Paper

ER -

Valencia-Alvarado R, De La Piedad-Beneitez A, López-Callejas R, Barocio SR, Mercado-Cabrera A, Peña-Eguiluz R et al. Titanium oxidation by rf inductively coupled plasma. 2014. Paper presented at Journal of Physics: Conference Series, . https://doi.org/10.1088/1742-6596/511/1/012077