TY - JOUR
T1 - Sequential microcontroller-based control for a chemical vapor deposition process
AU - Pérez, Edgar Serrano
AU - Pérez, Javier Serrano
AU - Piñón, Fernando Martínez
AU - García, José Manuel Juárez
AU - Pérez, Omar Serrano
AU - López, Fernando Juárez
N1 - Publisher Copyright:
© 2017 Universidad Nacional Autónoma de México, Centro de Ciencias Aplicadas y Desarrollo Tecnológico
PY - 2017/12
Y1 - 2017/12
N2 - A cost-effective direct liquid injection system is developed for a chemical vapor deposition process using a microcontroller. The precursor gas phase is controlled by the precise sequential injection of a liquid precursor solution to a vaporizing chamber prior deposition. The electronic control system allows the human–machine interface through a LCD display and a keypad matrix. The core of the electronic system is based on an electro mechanical injector operated in time and frequency as a sequential control system by a popular PIC16F877A chip. The software has been developed in the BASIC language and it can be easily modified through an ICSP programmer for different sequential automatized routines. The injection calibration test has proven the linearity of the injection control system for different operation parameters. The results reported the sequential injection MOCVD deposition of alumina thin film.
AB - A cost-effective direct liquid injection system is developed for a chemical vapor deposition process using a microcontroller. The precursor gas phase is controlled by the precise sequential injection of a liquid precursor solution to a vaporizing chamber prior deposition. The electronic control system allows the human–machine interface through a LCD display and a keypad matrix. The core of the electronic system is based on an electro mechanical injector operated in time and frequency as a sequential control system by a popular PIC16F877A chip. The software has been developed in the BASIC language and it can be easily modified through an ICSP programmer for different sequential automatized routines. The injection calibration test has proven the linearity of the injection control system for different operation parameters. The results reported the sequential injection MOCVD deposition of alumina thin film.
KW - Chemical vapor deposition
KW - Direct liquid injection
KW - Microcontroller
KW - Thin films
UR - http://www.scopus.com/inward/record.url?scp=85037585586&partnerID=8YFLogxK
U2 - 10.1016/j.jart.2017.07.003
DO - 10.1016/j.jart.2017.07.003
M3 - Artículo
AN - SCOPUS:85037585586
SN - 1665-6423
VL - 15
SP - 593
EP - 598
JO - Journal of Applied Research and Technology
JF - Journal of Applied Research and Technology
IS - 6
ER -