Q-switched, 1064nm laser source for photo-mechanical ablation in obsidianus lapis

A. I. Aguilar-Morales, J. A. Alvarez-Chavez, A. J. Morales-Ramirez, Michael Panzner, M. A. Ortega-Delgado

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

The process of ablation in obsidianus lapis is mainly governed by pulse energy from the laser source and scanning speed. The rate of material ablation is influenced by chemical and physical properties. In this work, laser energy at 1064 nm, has been used for ablation behavior in Q-switch regime. A >40 W, average power Nd:YAG source with pulse energies ranging from 3mJ to nearly 7 mJ, achieved surface damages up to 160 μm of depth. Photo-mechanical ablation in terms of scan speed showed a maximum depth of nearly 500 μm at 130 mm/s. The maximum pulse energy of 12 mJ resulted in ablation of 170 μm depth. Highly efficient ablation in obsidianus lapis for artistic work is an interesting field of application.

Original languageEnglish
Title of host publicationOptomechanical Engineering 2015
EditorsAlson E. Hatheway
PublisherSPIE
ISBN (Electronic)9781628417395
DOIs
StatePublished - 2015
Externally publishedYes
EventOptomechanical Engineering 2015 - San Diego, United States
Duration: 10 Aug 201512 Aug 2015

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume9573
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceOptomechanical Engineering 2015
Country/TerritoryUnited States
CitySan Diego
Period10/08/1512/08/15

Keywords

  • Ablation threshold
  • Engraving
  • Laser
  • Obsidianus lapis
  • Polishing
  • Pulse energy
  • Rock

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