TY - JOUR
T1 - Preparation of nanostructured Al2O3-TiO2 composite films by MOCVD
AU - Pérez, J. A.Galaviz
AU - Valero, J. A.Montes de Oca
AU - García, J. R.Vargas
AU - Rosales, H. J.Dorantes
N1 - Funding Information:
Authors wish to thank the financial support through the projects IPN-SIP-2007-0618, IPN-SIP-2008-0801 and IPN-SIP 20080927. Author J. A. Galaviz Pérez wishes to thank the National Council of Science and Technology (CONACYT) for the financial support for obtaining the master degree.
PY - 2010/4/16
Y1 - 2010/4/16
N2 - Nanostructured Al2O3-TiO2 composite films were prepared on glass substrates by metalorganic chemical vapor deposition (MOCVD) using aluminum acetylacetonate and titanium tetraisopropoxide precursors. Oxygen and argon were used as the reactive and carrier gases, respectively. Deposition temperature (Tdep) was varied from 723 to 873 K and total pressure was kept constant at 133-266 Pa. The formation of composite films was achieved by mixing the precursor vapors, which were obtained by heating the aluminum and titanium precursors at 403 and 323-353 K, respectively. The films were characterized by XRD, SEM, EPMA and TEM. The crystalline structure and the surface morphology of the nanostructured Al2O3-TiO2 composite films were strongly dependent on the precursor and deposition temperatures.
AB - Nanostructured Al2O3-TiO2 composite films were prepared on glass substrates by metalorganic chemical vapor deposition (MOCVD) using aluminum acetylacetonate and titanium tetraisopropoxide precursors. Oxygen and argon were used as the reactive and carrier gases, respectively. Deposition temperature (Tdep) was varied from 723 to 873 K and total pressure was kept constant at 133-266 Pa. The formation of composite films was achieved by mixing the precursor vapors, which were obtained by heating the aluminum and titanium precursors at 403 and 323-353 K, respectively. The films were characterized by XRD, SEM, EPMA and TEM. The crystalline structure and the surface morphology of the nanostructured Al2O3-TiO2 composite films were strongly dependent on the precursor and deposition temperatures.
KW - Alumina-titania
KW - Composite films
KW - MOCVD
KW - Nanostructures
UR - http://www.scopus.com/inward/record.url?scp=77950929517&partnerID=8YFLogxK
U2 - 10.1016/j.jallcom.2009.10.200
DO - 10.1016/j.jallcom.2009.10.200
M3 - Artículo
SN - 0925-8388
VL - 495
SP - 617
EP - 619
JO - Journal of Alloys and Compounds
JF - Journal of Alloys and Compounds
IS - 2
ER -