Preparation of molybdenum oxide thin films by MOCVD

R. Martinez Guerrero, J. R.Vargas Garcia, V. Santes, E. Gomez

Research output: Contribution to journalArticle

27 Citations (Scopus)

Abstract

In this study, molybdenum oxide films were prepared in a horizontal hot-wall MOCVD apparatus using molybdenum dioxide acetylacetonate as precursor. The molybdenum precursor was synthesized from acetylacetone and molybdenum oxide powder. Thermal gravimetric (TG) and differential thermal analyses (DTA) of the precursor suggested the formation of molybdenum oxides around 430 °C (703 K). Thus, a range of deposition temperatures varying from 350 to 630 °C (623-903 K) was explored to investigate the effects on the nature of the molybdenum oxide films. X-ray diffraction (XRD) results showed that the films consisted of α-MoO3 phase at deposition temperatures ranging from 400 to 560 °C (673-833 K). Crystalline α-MoO3 films can be obtained from molybdenum dioxide acetylacetonate precursor, without need of a post-annealing treatment. The best crystalline quality was found in films having needle-like crystallites grown at deposition temperature of about 560 °C (833 K), which exhibit a strong (0 1 0) preferred orientation and a transparent visual appearance. © 2006 Elsevier B.V. All rights reserved.
Original languageAmerican English
Pages (from-to)701-703
Number of pages630
JournalJournal of Alloys and Compounds
DOIs
StatePublished - 31 May 2007

Fingerprint

Molybdenum oxide
Metallorganic chemical vapor deposition
molybdenum
Oxide films
oxide
Molybdenum
Thin films
Crystalline materials
Crystallites
Needles
Powders
Temperature
Annealing
temperature
X ray diffraction
preferred orientation
annealing
X-ray diffraction
Hot Temperature
molybdenum dioxide

Cite this

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Preparation of molybdenum oxide thin films by MOCVD. / Guerrero, R. Martinez; Garcia, J. R.Vargas; Santes, V.; Gomez, E.

In: Journal of Alloys and Compounds, 31.05.2007, p. 701-703.

Research output: Contribution to journalArticle

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