Potential barrier study at the InGaAs/InAs quantum dot interface in asymmetric multi quantum well structures

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Abstract

The photoluminescence and its temperature dependences have been investigated for the InAs quantum dots embedded in the asymmetric GaAs/In xGa1-xAs/In0.15Ga0.85As/GaAs quantum wells (dot-in-a-well, DWELL structures) as a function of the In content x (x = 0.10-0.25) in the capping InxGa1-xAs layer. The study of PL temperature dependences in the range of 80-120 K has revealed the potential barrier for electrons at the capping InxGa1-xAs/InAs QD interface. The value of mentioned barrier has varied in QD structures with the different InxGa1-xAs capping layer compositions and it was estimated in the studied asymmetric GaAs/InxGa1-xAs/ In0.15Ga0.85As/GaAs DWELL structures. It is shown that the barrier for electrons equal to 48 and 24 meV appears in the InGaAs conduction band at the formation of InGaAs QW/InAs QD interface for the In compositions of x = 0.10 and 0.15, respectively. This barrier has not been detected in DWELLs with the In compositions x = 0.20 and 0.25. The energy gap offsets at the InAs/InxGa1-xAs interface in studied structures has been estimated and discussed as well.

Translated title of the contributionEstudio de barrera potencial en la interfaz de puntos cuánticos InGaAs/InAs en estructuras asimétricas de pozos cuánticos múltiples
Original languageEnglish
Pages (from-to)1364-1367
Number of pages4
JournalMaterials Science and Engineering B: Solid-State Materials for Advanced Technology
Volume176
Issue number17
DOIs
StatePublished - 25 Oct 2011

Keywords

  • InAs quantum dots
  • InGaAs/GaAs quantum wells
  • Photoluminescence

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