TY - JOUR
T1 - Nanostructured nickel oxide films prepared by chemical vapor deposition and their electrochromic properties
AU - Garcia, J. R.Vargas
AU - Ugalde, E. M.Lazcano
AU - Santiago, F. Hernandez
AU - Lopez, J. M.Hallen
PY - 2008/5
Y1 - 2008/5
N2 - The influence of the deposition conditions on the structural features and electrochromic properties of nickel oxide (NiO) films prepared by chemical vapor deposition has been investigated. NiO films have been prepared on fluorine doped tin oxide (FTO) coated glass substrates from nickel-acetylacetonate precursor and their electrochromic properties have been studied by cyclic voltammetry in a 0.1 M KOH solution at room temperature. Films exhibiting only the NiO phase were obtained at deposition temperatures higher than 450°C in a wide range of reactor pressures (0.13 to 66.6 kPa). Particularly, NiO films prepared at 500-550°C from 0.13 to 53.3 kPa are transparent in nature and exhibit a crystallite size varying from 10 to 60 nm. An appreciable anodic electrochromic change from transparent to black coloured resulted from a very porous surface morphology and film thickness of about 3.5 μm. The electrochromic change was maintained over 3000 switching cycles. Nanostructured 3.5 μm-thick NiO films showed a maximum difference in optical transmittance of about 40% in the near-infrared region. These results make the nanostructured NiO films comparables with those prepared by other deposition techniques.
AB - The influence of the deposition conditions on the structural features and electrochromic properties of nickel oxide (NiO) films prepared by chemical vapor deposition has been investigated. NiO films have been prepared on fluorine doped tin oxide (FTO) coated glass substrates from nickel-acetylacetonate precursor and their electrochromic properties have been studied by cyclic voltammetry in a 0.1 M KOH solution at room temperature. Films exhibiting only the NiO phase were obtained at deposition temperatures higher than 450°C in a wide range of reactor pressures (0.13 to 66.6 kPa). Particularly, NiO films prepared at 500-550°C from 0.13 to 53.3 kPa are transparent in nature and exhibit a crystallite size varying from 10 to 60 nm. An appreciable anodic electrochromic change from transparent to black coloured resulted from a very porous surface morphology and film thickness of about 3.5 μm. The electrochromic change was maintained over 3000 switching cycles. Nanostructured 3.5 μm-thick NiO films showed a maximum difference in optical transmittance of about 40% in the near-infrared region. These results make the nanostructured NiO films comparables with those prepared by other deposition techniques.
KW - Chemical vapor deposition
KW - Electrochromism
KW - Nickel oxide films
UR - http://www.scopus.com/inward/record.url?scp=45849092249&partnerID=8YFLogxK
U2 - 10.1166/jnn.2008.563
DO - 10.1166/jnn.2008.563
M3 - Artículo
AN - SCOPUS:45849092249
SN - 1533-4880
VL - 8
SP - 2703
EP - 2706
JO - Journal of Nanoscience and Nanotechnology
JF - Journal of Nanoscience and Nanotechnology
IS - 5
ER -