High-K dielectric sulfur-selenium alloys

Sandhya Susarla, Thierry Tsafack, Peter Samora Owuor, Anand B. Puthirath, Jordan A. Hachtel, Ganguli Babu, Amey Apte, Ben Maan I. Jawdat, Martin S. Hilario, Albert Lerma, Hector A. Calderon, Francisco C.Robles Hernandez, David W. Tam, Tong Li, Andrew R. Lupini, Juan Carlos Idrobo, Jun Lou, Bingqing Wei, Pengcheng Dai, Chandra Sekhar TiwaryPulickel M. Ajayan

Research output: Contribution to journalArticlepeer-review

11 Scopus citations

Abstract

Upcoming advancements in flexible technology require mechanically compliant dielectric materials. Current dielectrics have either high dielectric constant, K (e.g., metal oxides) or good flexibility (e.g., polymers). Here, we achieve a golden mean of these properties and obtain a lightweight, viscoelastic, high-K dielectric material by combining two nonpolar, brittle constituents, namely, sulfur (S) and selenium (Se). This S-Se alloy retains polymer-like mechanical flexibility along with a dielectric strength (40 kV/mm) and a high dielectric constant (K = 74 at 1MHz) similar to those of established metal oxides. Our theoretical model suggests that the principal reason is the strong dipole moment generated due to the unique structural orientation between S and Se atoms. The S-Se alloys can bridge the chasm between mechanically soft and high-K dielectric materials toward several flexible device applications.

Original languageEnglish
Article numbereaau9785
JournalScience Advances
Volume5
Issue number5
DOIs
StatePublished - 2019
Externally publishedYes

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