Effects of heavy Si doping on the structural and optical properties of n-GaN/AlN/Si(111) heterostructures

M. A. Zambrano-Serrano, Carlos A. Hernández, O. de Melo, M. Behar, S. Gallardo-Hernández, Y. L. Casallas-Moreno, A. Ponce, A. Hernandez-Robles, D. Bahena-Uribe, C. M. Yee-Rendón, M. López-López

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Abstract

n-GaN/ AlN heterostructures were grown by molecular beam epitaxy on Si(111) substrates.The GaN films were n-type doped with silicon and the effect of doping concentration on the structural and optical properties was studied. Si doping promotes a reduction of dislocation density as revealed by x-ray data analysis and Transmission Electron Microscopy. Furthermore, a decrease in the yellow band measured by Photoluminescence Spectroscopy was observed when silicon doping concentration was increased up to 1.7 × 1019 atoms cm−3. A particular mosaic structure was induced by the Si-doping as inferred from Rutherford Backscattering measurements. The crystal quality shows a small degradation for very heavily doped samples (1.3 × 1020 atoms cm−3).

Original languageEnglish
Article number065903
JournalMaterials Research Express
Volume9
Issue number6
DOIs
StatePublished - 1 Jun 2022

Keywords

  • GaN
  • RBS
  • Si-doping
  • crystal defects
  • heteroepitaxy
  • molecular beam epitaxy
  • silicon

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