Effect of the stoichiometry of Si-rich silicon nitride thin films on their photoluminescence and structural properties

T. V. Torchynska, J. L. Casas Espinola, E. Vergara Hernandez, L. Khomenkova, F. Delachat, A. Slaoui

Research output: Contribution to conferencePaper

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Abstract

© 2014 Elsevier B.V. All rights reserved. Si-rich Silicon nitride films were grown on silicon substrates by plasma enhanced chemical vapor deposition. The film stoichiometry was controlled via the variation of NH3/SiH4 ratio from 0.45 up to 1.0. Thermal annealing at 1100 °C for 30 min in the nitrogen flow was applied to form the Si nanocrystals in the films that have been investigated by means of photoluminescence and Raman scattering methods, as well as transmission electron microscopy. Several emission bands have been detected with the peak positions at: 2.8-3.0 eV, 2.5-2.7 eV, 2.10-2.25 eV, and 1.75-1.98 eV. The temperature dependences of photoluminescence spectra were studied with the aim to confirm the types of optical transitions and the nature of light emitting defects in silicon nitride. The former three bands were assigned to the defects in silicon nitride, whereas the last one (1.75-1.98 eV) was attributed to the exciton recombination inside of Si nanocrystals. The photoluminescence mechanism is discussed.
Original languageAmerican English
Pages65-69
Number of pages58
DOIs
StatePublished - 30 Apr 2015
EventThin Solid Films -
Duration: 1 Dec 2015 → …

Conference

ConferenceThin Solid Films
Period1/12/15 → …

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