Comparison of CdS Thin Films Prepared by the Traditional and Shallow Chemical Bath Deposition Method

Chemical bath deposition (CBD) is one of the most used methods for CdS thin films deposition, but nevertheless, the by-product from the reaction constitutes a source of gross contamination. To reduce these residues, shallow-CBD (S-CBD) is proposed as an alternative method. Albeit this method only requires 25% of solution compared to traditional-CBD (T-CDB), making this method suitable to be used in device fabrication technology. In this work, a comparison between both techniques idone through the optical (UV–vis), structural (X-ray diffraction), morphology (scanning electron microscopy), and electrical properties such as four-point resistivity and temperature–current dependence from CdS layers analysis, deposited by S-CBD and T-CBD, is reported.