Antireflection coating for ZnIn2S4 single crystals

O. Vigil; S. Lopez; E. Morris; F. Leccabue

doi:10.1063/1.339764

Antireflection coating for ZnIn₂S₄ single crystals

O. Vigil, S. Lopez, E. Morris, F. Leccabue

Research output: Contribution to journal › Article › peer-review

Abstract

Single- and double-layer thin-film antireflection coatings have been computer designed for ZnIn₂S₄ single crystals. The parameters of the thin-film layers, i.e., optimal thickness and refractive index, were determined. SiO_x thin films, as antireflection coatings, have been deposited by reactive sputtering in order to reduce the average reflectance and to increase the photocurrent of the ZnIn₂S ₄ single crystal.

Original language	English
Pages (from-to)	653-656
Number of pages	4
Journal	Journal of Applied Physics
Volume	62
Issue number	2
DOIs	https://doi.org/10.1063/1.339764
State	Published - 1987
Externally published	Yes

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title = "Antireflection coating for ZnIn2S4 single crystals",

abstract = "Single- and double-layer thin-film antireflection coatings have been computer designed for ZnIn2S4 single crystals. The parameters of the thin-film layers, i.e., optimal thickness and refractive index, were determined. SiOx thin films, as antireflection coatings, have been deposited by reactive sputtering in order to reduce the average reflectance and to increase the photocurrent of the ZnIn2S 4 single crystal.",

author = "O. Vigil and S. Lopez and E. Morris and F. Leccabue",

year = "1987",

doi = "10.1063/1.339764",

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AU - Lopez, S.

AU - Morris, E.

AU - Leccabue, F.

PY - 1987

Y1 - 1987

N2 - Single- and double-layer thin-film antireflection coatings have been computer designed for ZnIn2S4 single crystals. The parameters of the thin-film layers, i.e., optimal thickness and refractive index, were determined. SiOx thin films, as antireflection coatings, have been deposited by reactive sputtering in order to reduce the average reflectance and to increase the photocurrent of the ZnIn2S 4 single crystal.

AB - Single- and double-layer thin-film antireflection coatings have been computer designed for ZnIn2S4 single crystals. The parameters of the thin-film layers, i.e., optimal thickness and refractive index, were determined. SiOx thin films, as antireflection coatings, have been deposited by reactive sputtering in order to reduce the average reflectance and to increase the photocurrent of the ZnIn2S 4 single crystal.

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U2 - 10.1063/1.339764

DO - 10.1063/1.339764

M3 - Artículo

SN - 0021-8979

VL - 62

SP - 653

EP - 656

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 2

ER -

Antireflection coating for ZnIn₂S₄ single crystals

Abstract

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